LiquiSonic® measures the HF concentration using the speed of sound in the process liquid. An ultrasonic pulse travels through the liquid between transmitter and receiver; the concentration is calculated in real time from the transit time. The method is independent of the liquid's color, turbidity, or conductivity and operates directly in the process without sampling.

The LiquiSonic® measuring system is used for HF applications. It consists of a sensor and controller and is installed directly in the plant's main pipeline.

The measurement accuracy is ± 0.05 wt%. This precision is achieved through direct speed-of-sound measurement combined with integrated temperature compensation that offsets process temperature fluctuations.

Depending on the application, SensoTech sensors are made with corrosion-resistant special materials tailored to the respective process chemistry. HF-resistant materials are used for all wetted components to ensure long-term stability even with aggressive media.

With inline measurement by LiquiSonic® directly in the process line, manual sampling is eliminated completely. This not only reduces labor but above all the safety risk for personnel who would otherwise come into direct contact with the HF-containing process liquid.

Yes, LiquiSonic® provides continuously updated measured values several times per second, which can be displayed online, stored, and evaluated. In contrast, laboratory analyses only provide selective snapshots.

The sensors are integrated directly into the existing main pipeline. This significantly reduces installation effort compared with alternative analysis methods.

Thanks to their robust, wear-free design, the sensors operate largely maintenance-free and without consumables. In addition, all wetted components are made of HF-resistant materials. This eliminates the need for regular recalibration as required with conventional measurement methods.

Yes, the LiquiSonic® measuring system provides the measurement data digitally and can be connected to higher-level control systems. Exceeding or falling below limit values is signaled immediately so that this information can be incorporated into existing safety procedures.

Fluctuations in HF concentration change the reaction conditions in the process and can impair both product quality and plant safety, for example through increased hydrofluoric acid consumption, intensified corrosion, or a rising leakage risk. Continuous measurement makes such deviations immediately visible and helps prevent risks.

Continuous inline measurement with LiquiSonic® detects changes in material composition immediately before they become critical. This allows early countermeasures and significantly reduces the risk of an uncontrolled reaction course ("acid runaway").

Through permanent concentration and phase monitoring with LiquiSonic®, deviations and leaks can be detected early before hydrofluoric acid passes unnoticed into downstream circuits. Complete online data recording also supports traceability in the event of a malfunction.

The LiquiSonic® sensors are installed directly in the main pipeline of the alkylation unit and simultaneously measure the concentration of hydrofluoric acid, water, and acid-soluble oils with an accuracy of ± 0.05 wt%. This enables optimal product quality with minimal hydrofluoric acid consumption and reduces the risk of acid runaways, corrosion, and leaks.

In semiconductor manufacturing, LiquiSonic® monitors the HF concentration in etching and cleaning processes such as SC1, SC2, or BOE/BHF in real time with temperature compensation. This allows the etching solution to be dosed precisely and maintained within the optimal concentration range, avoiding over- or under-etching of the wafer.